Photoresist,  also  known  as  photoresist,  refers  to  a  corrosion-resistant  film  material  that  undergoes  changes  in solubility  due  to  irradiation  or  radiation  by  ultraviolet  light,  electron  beam ,  ion  beam,  X-ray,  etc.  Photoresist  is composed  of  sensitizers  (photoinitiators),  photosensitive  resins  (polymerizers),  solvents,  and  additives.   In  the manufacturing process of integrated circuits, photolithography accounts for approximately 35% of the entire chip manufacturing cost, and is the most core process in semiconductor manufacturing. The materials involved include various solvents, acids, bases, high-purity organic reagents, high-purity gases, etc. Among all reagents, photoresist has the highest technical requirements. Therefore, the detection of the entire photoresist industry chain process is very important.